Positive and Negative Lithography by Photochemical Metalorganic Deposition from Metal 2-ethylhexanoates
نویسندگان
چکیده
منابع مشابه
Complex Metal Oxide Thin Film Growth by Metalorganic Chemical Vapor Deposition
Title of Document: COMPLEX METAL OXIDE THIN FILM GROWTH BY METALORGANIC CHEMICAL VAPOR DEPOSITION Seung-Yeul Yang, Doctor of Philosophy, 2005 Directed By: Professor Ramamoorthy Ramesh, Department of Materials Science and Engineering The phenomenon of ferroelectricity recently attracted great attention with the successful advances in the development of thin-film fabrication. This development ena...
متن کاملHigh optical quality polycrystalline indium phosphide grown on metal substrates by metalorganic chemical vapor deposition
substrates by metalorganic chemical vapor deposition Maxwell Zheng, Zhibin Yu, Tae Joon Seok, Yu-Ze Chen, Rehan Kapadia, Kuniharu Takei, Shaul Aloni, Joel W. Ager, Ming Wu, Yu-Lun Chueh, and Ali Javey Department of Electrical Engineering and Computer Sciences, University of California, Berkeley, California 94720, USA Lawrence Berkeley National Laboratory, Material Sciences Division, Berkeley, C...
متن کاملMETALORGANIC CHEMICAL VAPOR DEPOSITION AND INVESTIGATION OF ALGAINN MICROSTRUCTURE by
......................................................................................................... x
متن کاملGRANULAR YBaCuO FILMS PREPARED BY METALORGANIC CHEMICAL AEROSOL DEPOSITION TECHNOLOGY
Fine-grain thin superconducting films can be prepared by metalorganic Chemical Aerosol Deposition Technology (CADT). In this paper, we present the preparation and properties of YBa2Cu307_ x films on the different substrates, Si and SrTiO 3 (100). It is shown that the zero-resistance temperature (Tc,0) of the films on SrTiO 3 substrates is about 90 K, and the critical current density (Jc) at 77 ...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
ژورنال
عنوان ژورنال: Journal of Photopolymer Science and Technology
سال: 2006
ISSN: 0914-9244,1349-6336
DOI: 10.2494/photopolymer.19.467